VERIFICATION OF A PROXIMITY EFFECT CORRECTION PROGRAM IN ELECTRON-BEAM LITHOGRAPHY

被引：25
作者：
KRATSCHMER, E
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期
关键词：
D O I：
10.1116/1.571257
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：1264 / 1268
页数：5
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