PLASMA-ASSISTED REACTIVE EVAPORATION OF ALUMINUM NITRIDE FILMS

被引：2
作者：
JUNG, T
SCHMIDT, M
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1987年 / 100卷 / 01期
关键词：
D O I：
10.1002/pssa.2211000123
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：207 / 211
页数：5
相关论文
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