THE STRUCTURE OF ALUMINUM FILMS DEPOSITED BY PARTIALLY IONIZED BEAM

被引：6
作者：
FIONOVA, LK
KONONENKO, OV
MATVEEV, VN
机构：
[1] Institute of Microelectronics Technology and High Purity Materials, Russia Academy of Sciences, 142432 Chernogolovka, Moscow District
来源：
SCRIPTA METALLURGICA ET MATERIALIA | 1992年 / 27卷 / 03期
关键词：
D O I：
10.1016/0956-716X(92)90521-F
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：329 / 333
页数：5
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