PERFORMANCE OF THE NEC PRODUCTION HIGH-ENERGY IMPLANTATION SYSTEM

被引：1

作者：

NORTON, GA

KLODY, GM

LOGER, RL

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 24-5卷

关键词：

D O I：

10.1016/S0168-583X(87)80249-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

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页码：793 / 796

页数：4

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[1] PRODUCTION MEV ION IMPLANTERS FOR ENERGIES FROM 200 KEV TO 4 MEV
RATHMELL, RD
NORTON, GA
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 21 (2-4) : 270 - 273
[2] SHEET RESISTANCE MONITORING OF LOW-DOSE IMPLANTS USING THE DOUBLE IMPLANT TECHNIQUE
SMITH, AK
JOHNSON, WH
KEENAN, WA
RIGIK, M
KLEPPINGER, R
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 21 (2-4) : 529 - 536