PROGRESS IN THE ANALYSIS OF THE MECHANISMS OF ION NITRIDING

被引：139
作者：
MICHEL, H
CZERWIEC, T
GANTOIS, M
ABLITZER, D
RICARD, A
机构：
[1] ECOLE MINES,INST NATL POLYTECH LORRAINE,SCI & GENIE MAT MET LAB,CNRS,UNITE RECH ASSOCIEE 1402,F-54042 NANCY,FRANCE
[2] UNIV PARIS 11,PHYS GAZ & PLASMAS LAB,CNRS,UNITE RECH ASSOCIEE,F-91405 ORSAY,FRANCE
来源：
SURFACE & COATINGS TECHNOLOGY | 1995年 / 72卷 / 1-2期
关键词：
PLASMA; NITRIDING; ACTIVE SPECIES; DIAGNOSTICS; MODELING;
D O I：
10.1016/0257-8972(94)02339-5
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this paper the mechanisms of ion nitriding are discussed, particular attention being paid to d.c. diode nitriding. Recent trends in the analysis of the mechanisms of d.c. diode nitriding are reviewed, emphasizing the importance of the cathode fall region. Diagnostics of active species and calculation of their densities in the plasma are presented and related to modelling. The hydrogen effect and plasma-solid interaction are also discussed. New developments and alternatives to d.c. diode nitriding such as triode nitriding are highlighted.
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收藏
页码：103 / 111
页数：9
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