X-RAY PHOTOELECTRON-SPECTROSCOPY AND AUGER-ELECTRON SPECTROSCOPY STUDIES OF GLOW-DISCHARGE SI1-XCX-H FILMS

被引：122

作者：

LEE, WY

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 06期

关键词：

D O I：

10.1063/1.328049

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3365 / 3372

页数：8

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[6] EARLY STAGES OF OXYGEN-ADSORPTION ON SILICON SURFACES AS SEEN BY ELECTRON-SPECTROSCOPY
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