STATUS OF THE GAAS METAL-OXIDE-SEMICONDUCTOR TECHNOLOGY

被引:67
作者
MIMURA, T
FUKUTA, M
机构
关键词
D O I
10.1109/T-ED.1980.19998
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1147 / 1155
页数:9
相关论文
共 53 条
[1]   FIRST ANODIC-OXIDE GAAS MOSFETS BASED ON EASY TECHNOLOGICAL PROCESSES [J].
BAYRAKTAROGLU, B ;
KOHN, E ;
HARTNAGEL, HL .
ELECTRONICS LETTERS, 1976, 12 (02) :53-54
[2]  
BAYRAKTAROGLU B, 1979, 37TH DEV RES C, pA3
[3]   GALLIUM ARSENIDE MOS TRANSISTORS [J].
BECKE, H ;
HALL, R ;
WHITE, J .
SOLID-STATE ELECTRONICS, 1965, 8 (10) :813-&
[4]  
BECKE HW, 1967, ELECTRONICS, P82
[5]   ELECTRICAL-PROPERTIES OF THERMAL OXIDES ON GAAS [J].
BUTCHER, DN ;
SEALY, BJ .
ELECTRONICS LETTERS, 1977, 13 (19) :558-559
[6]   USE OF OXYGEN-DOPED ALXGA1-XAS FOR INSULATING LAYER IN MIS STRUCTURES [J].
CASEY, HC ;
CHO, AY ;
NICOLLIAN, EH .
APPLIED PHYSICS LETTERS, 1978, 32 (10) :678-679
[7]   ANODIC OXIDE ON GAAS - QUANTITATIVE CHEMICAL DEPTH PROFILES OBTAINED USING AUGER-SPECTROSCOPY AND NEUTRON-ACTIVATION ANALYSIS [J].
CHANG, CC ;
SCHWARTZ, B ;
MURARKA, SP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (06) :922-926
[8]   PLASMA-GROWN OXIDE ON GAAS - SEMI-QUANTITATIVE CHEMICAL DEPTH PROFILES OBTAINED USING AUGER-SPECTROSCOPY AND NEUTRON-ACTIVATION ANALYSIS [J].
CHANG, CC ;
CHANG, RPH ;
MURARKA, SP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) :481-487
[9]   PLASMA OXIDATION OF GAAS [J].
CHANG, RPH ;
SINHA, AK .
APPLIED PHYSICS LETTERS, 1976, 29 (01) :56-58
[10]   DC PLASMA ANODIZATION OF GAAS [J].
CHESLER, LA ;
ROBINSON, GY .
APPLIED PHYSICS LETTERS, 1978, 32 (01) :60-62