LOCALIZATION AND NEGATIVE MAGNETORESISTANCE IN THIN COPPER-FILMS

被引：60

作者：

VANHAESENDONCK, C ^{[1
]}

VANDENDRIES, L ^{[1
]}

BRUYNSERAEDE, Y ^{[1
]}

DEUTSCHER, G ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,DEPT PHYS,LOS ANGELES,CA 90024

来源：

PHYSICAL REVIEW B | 1982年 / 25卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.25.5090

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：5090 / 5096

页数：7

相关论文

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