PROPERTIES OF DIELECTRIC COATINGS PRODUCED BY ION ASSISTED DEPOSITION

被引：12

作者：

GU, PF

CHEN, YM

HU, XQ

TANG, JF

机构：

来源：

APPLIED OPTICS | 1989年 / 28卷 / 16期

关键词：

D O I：

10.1364/AO.28.003318

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：3318 / 3322

页数：5

共 8 条

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[6] ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT [J].

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[7] PROPERTIES OF TIO2 AND SIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION [J].

MCNEIL, JR ;

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[8]

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