A STUDY OF THE MICROSTRUCTURE OF EPITAXIAL HETEROSTRUCTURES OF YBA2CU3O7 AND PRBA2CU3O7

被引：29

作者：

JIA, CL ^{[1
]}

KABIUS, B ^{[1
]}

SOLTNER, H ^{[1
]}

POPPE, U ^{[1
]}

URBAN, K ^{[1
]}

SCHUBERT, J ^{[1
]}

BUCHAL, C ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH GMBH,INST SCHICHT & IONENTECH,W-5170 JULICH,GERMANY

来源：

PHYSICA C | 1990年 / 167卷 / 5-6期

关键词：

D O I：

10.1016/0921-4534(90)90661-W

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Multilayers with a sequence of YBa2Cu3O7/PrBa2Cu3O7/YBa2Cu3O7 have been sputtered epitaxially on [001] SrTiO3 substrates. The heterostructures of these samples have been characterized by high-resolution electron microscopy, Rutherford backscattering and energy-dispersive X-ray analysis. The results indicate a correlation between the substrate quality and the microstructure of the thin films. Substrates with low defect density, a very smooth surface, and good orientation favour the epitaxial growth of all three layers. The chemical composition across the interface changes within the dimension of one unit cell. © 1990.

引用

页码：463 / 471

页数：9

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