ETCHING OF ZINC-OXIDE FILMS BY ACETYLACETONE

被引：0
|
作者：
NISHINO, J
FURUSE, S
SATOH, A
OHSHIO, S
KAMATA, K
机构：
来源：
NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN | 1995年 / 103卷 / 01期
关键词：
ETCHING; ACETYLACETONE; ZNO; FILM; NP-CVD; RF-MAGNETRON SPUTTERING; WET ETCHING;
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A new etching method using organic solvents instead of acids was developed for ZnO films as well as MgO films. ZnO films prepared by normal pressure chemical vapor deposition (NP-CVD) and R.F.-magnetron sputtering were etched at 30-60-degrees-C in a methanol solution of acetylacetone (2,4-pentadione). The etching rate of the film prepared by R.F.-magnetron sputtering was smaller than that prepared by NP-CVD. The activation energy of etching for the film prepared by R.F.-magnetron sputtering was 59 kJ.mol-1.
引用
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页码：85 / 87
页数：3
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