EFFECT OF THE DEPOSITION SEQUENCE ON THE GROWTH OF YBA2CU3O7-DELTA FILMS BY CHEMICAL-VAPOR-DEPOSITION

被引：11

作者：

MATSUBARA, M

MORISHITA, T

HIRABAYASHI, I

机构：

[1] Superconductivity Research Laboratory, Nagoya Division, International Superconductivity Technology Center, Atsuta-ku, Nagoya 456

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 14期

关键词：

D O I：

10.1063/1.111782

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have investigated the possibility of layer-by-layer growth in the metalorganic chemical vapor deposition of YBa2Cu3O7-delta In this study, the source gases were supplied alternately by various sequences in the form of a subunit cell block. Films deposited on MgO and SrTiO3 (STO) substrates were investigated by x-ray diffraction, scanning electron microscopy, and atomic force microscopy. We found the surface morphology and composition of the deposited films were highly dependent on the selection of the blocks and the deposition sequence. The best film on the MgO or STO substrates were obtained by sequence starting with the Ba layer, then followed by the /Cu,Y,Cu/ block, and ending up with the Cu-O chain layer. This result can be explained by the good wettability of Ba onto the substrates and the suppression of forming impurity phases such as barium cuprates.

引用

页码：1868 / 1870

页数：3

共 16 条

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