HYDROGEN IN SEMI-INSULATING POLYCRYSTALLINE SILICON FILMS

被引:44
作者
KNOLLE, WR [1 ]
MAXWELL, HR [1 ]
BENENSON, RE [1 ]
机构
[1] SUNY ALBANY,DEPT PHYS,ALBANY,NY 12222
关键词
D O I
10.1063/1.328302
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:4385 / 4390
页数:6
相关论文
共 34 条
[1]  
BAGLEY BG, 1979, MAY EL SOC M, P175
[2]   HYDRIDES AND HYDROXYLS IN THIN SILICON DIOXIDE FILMS [J].
BECKMANN, KH ;
HARRICK, NJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) :614-&
[3]   HYDROGEN RATIOS AND PROFILES IN DEPOSITED AMORPHOUS AND POLYCRYSTALLINE FILMS AND IN METALS USING NUCLEAR TECHNIQUES [J].
BENENSON, RE ;
FELDMAN, LC ;
BAGLEY, BG .
NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3) :547-550
[4]   THEORETICAL ANALYSIS OF ENERGY-SPECTRA OF BACKSCATTERED IONS [J].
BRICE, DK .
THIN SOLID FILMS, 1973, 19 (01) :121-135
[5]  
BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556
[6]   QUANTITATIVE-ANALYSIS OF HYDROGEN IN GLOW-DISCHARGE AMORPHOUS SILICON [J].
BRODSKY, MH ;
FRISCH, MA ;
ZIEGLER, JF ;
LANFORD, WA .
APPLIED PHYSICS LETTERS, 1977, 30 (11) :561-563
[7]   SIMS ANALYSIS OF DEUTERIUM DIFFUSION IN HYDROGENATED AMORPHOUS SILICON [J].
CARLSON, DE ;
MAGEE, CW .
APPLIED PHYSICS LETTERS, 1978, 33 (01) :81-83
[8]  
FRITZSCHE H, 1978, SOLID STATE TECHNOL, V21, P55
[9]  
Gerasimenko N. N., 1978, Journal of Applied Spectroscopy, V28, P600, DOI 10.1007/BF00619675
[10]  
KERAMATI B, 1978, 1978 P INT TOP C YOR, P459