DIFFUSION IN THIN-FILMS

被引：0

作者：

GUPTA, D ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF METALS | 1987年 / 39卷 / 07期

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：A23 / A23

页数：1

共 50 条

[31] LATERAL SELF-DIFFUSION AND ELECTROMIGRATION IN COBALT THIN-FILMS
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[40] DIFFUSION AND TRAPPING IN ZNS-MN ELECTROLUMINESCENT THIN-FILMS
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