ON THE NATURE OF STRUCTURAL RELAXATION IN AMORPHOUS AS2S3

被引：8

作者：

JACOBSEN, H ^{[1
]}

FORDERER, M ^{[1
]}

BISCHOF, J ^{[1
]}

KASPER, G ^{[1
]}

HUNKLINGER, S ^{[1
]}

TETERIS, J ^{[1
]}

机构：

[1] ACAD SCI LASSR,INST PHYS,RIGA 226006,LATVIA,USSR

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷

关键词：

D O I：

10.1016/S0022-3093(05)80287-X

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have measured the low-frequency elastic properties of amorphous As2S3-films in the temperature range from 8 mK to 350 K. The samples investigated were treated in four different ways: as-evaporated, illuminated, annealed, and both annealed and illuminated. Around 270 K a huge peak was observed in the internal-friction measurement which was strongly influenced by the sample treatment. In contrast, the behaviour at low temperatures was not affected by the light- and thermally induced structural changes, suggesting that the tunneling entities of the relevant systems are built up by a relatively large number of atoms.

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页码：989 / 992

页数：4

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