ENERGY DEPOSITION BY ICRF HEATING IN DENSE-PLASMAS

被引：0
|
作者：
TAKAHASHI, H [1 ]
机构：
[1] MIT,CAMBRIDGE,MA 02139
来源：
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY | 1979年 / 24卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
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页码：969 / 969
页数：1
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