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CONCENTRATION DEPENDENT DIFFUSION OF ARSENIC IN SILICON
被引:27
作者
:
KENNEDY, DP
论文数:
0
引用数:
0
h-index:
0
KENNEDY, DP
MURLEY, PC
论文数:
0
引用数:
0
h-index:
0
MURLEY, PC
机构
:
来源
:
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS
|
1971年
/ 59卷
/ 02期
关键词
:
D O I
:
10.1109/PROC.1971.8172
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:335 / +
页数:1
相关论文
共 6 条
[1]
BOLTAKS BI, 1963, DIFFUSION SEMICONDUC, P124
[2]
Chang J. J., 1963, IEEE T ELECTRON DEV, V10, P357
[3]
GHOSH HN, 1970, OCT IEEE INT EL DEV
[4]
JOSHI ML, 1970, OCT EL SOC M ATL CIT
[5]
ARSENIC ISOCONCENTRATION DIFFUSION STUDIES IN SILICON
MASTERS, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
MASTERS, BJ
FAIRFIEL.JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
FAIRFIEL.JM
[J].
JOURNAL OF APPLIED PHYSICS,
1969,
40
(06)
: 2390
-
&
[6]
VORA MB, 1970, OCT IEEE INT EL DEV
←
1
→
共 6 条
[1]
BOLTAKS BI, 1963, DIFFUSION SEMICONDUC, P124
[2]
Chang J. J., 1963, IEEE T ELECTRON DEV, V10, P357
[3]
GHOSH HN, 1970, OCT IEEE INT EL DEV
[4]
JOSHI ML, 1970, OCT EL SOC M ATL CIT
[5]
ARSENIC ISOCONCENTRATION DIFFUSION STUDIES IN SILICON
MASTERS, BJ
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
MASTERS, BJ
FAIRFIEL.JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Components Division, East Fishkill Facility, Hopewell Junction
FAIRFIEL.JM
[J].
JOURNAL OF APPLIED PHYSICS,
1969,
40
(06)
: 2390
-
&
[6]
VORA MB, 1970, OCT IEEE INT EL DEV
←
1
→