ELECTROFORMED THIN GOLD-FILMS ON REGULARLY CORRUGATED SUBSTRATES

被引：1
|
作者：
NEWTON, MI
MCHALE, G
SMITH, D
机构：
[1] Department of Chemistry and Physics, Nottingham Polytechnic, Nottingham, NG11 8NS, Clifton Lane
来源：
VACUUM | 1993年 / 44卷 / 10期
关键词：
D O I：
10.1016/0042-207X(93)90287-K
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin gold films deposited on regularly corrugated glass substrates of period 1.7 mum have been studied. In contrast to an earlier study electroformation of the film is found to occur. Immediately following electroformation electron emission (EE) is observed, but this is not accompanied by a clear negative differential resistance (NDR) in the current voltage (I-V) characteristic. However, a low-field peak in the conduction current followed by a minima can be initiated by subjecting the sample to higher values of electric field. Such a valley following a current peak has not previously been observed for electroformed thin gold films on glass substrates.
引用
收藏
页码：1001 / 1003
页数：3
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