FUNDAMENTALS OF ION PLATING

被引：190

作者：

MATTOX, DM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.1318041

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：47 / 52

页数：6

共 46 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J].

AISENBERG, S ;

CHABOT, R .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) :2953-+

[2]

BLAND RD, 1968, ELECTROCHEM TECHNOL, V6, P272

[3] ROLE OF ADHERENCE OXIDES IN DEVELOPMENT OF CHEMICAL BONDING AT GLASS-METAL INTERFACES [J].

BOROM, MP ;

PASK, JA .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1966, 49 (01) :1-&

[4] INFLUENCE OF ION-BOMBARDMENT ON MICROSTRUCTURE OF THICK DEPOSITS PRODUCED BY HIGH RATE PHYSICAL VAPOR-DEPOSITION PROCESSES [J].

BUNSHAH, RF ;

JUNTZ, RS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1404-&

[5]

CHESTER AN, 1968, PHYS REV, V167, P172

[6]

CULBERTON R, 1966, 8TH C TUB TECHN IEEE, P101

[7]

CULBERTSON RD, 1971, Patent No. 3604970

[8] ION ENERGIES AT CATHODE OF A GLOW DISCHARGE [J].

DAVIS, WD ;

VANDERSLICE, TA .

PHYSICAL REVIEW, 1963, 131 (01) :219-&

[9] ANALYSIS AND DESIGN OF ION-BEAM DEPOSITION APPARATUS [J].

FAIR, RB .

JOURNAL OF APPLIED PHYSICS, 1971, 42 (08) :3176-&

[10] PRODUCTION AND DEMONSTRATION OF ATOMICALLY CLEAN METAL SURFACES [J].

HAGSTRUM, HD ;

DAMICO, C .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (04) :715-723

← 1 2 3 4 5 →