PLASMA X-RAY SOURCE FOR LITHOGRAPHY GENERATED BY A-ALMOST-EQUAL-TO-30 J, 30 NS KRF LASER

被引：18

作者：

DAVIS, GM

GOWER, MC

ONEILL, F

TURCU, ICE

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 17期

关键词：

D O I：

10.1063/1.99919

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1583 / 1585

页数：3

共 8 条

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[8]

Turcu E., 1987, Microelectronic Engineering, V6, P287, DOI 10.1016/0167-9317(87)90051-7

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