MASS-FLOW MEASUREMENT AND CONTROL OF LOW VAPOR-PRESSURE SOURCES

被引：11
作者：
SULLIVAN, JJ
SCHAFFER, S
JACOBS, RP
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.575905
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：2387 / 2392
页数：6
相关论文
共 7 条
[1]   LOW-PRESSURE DEPOSITION OF HIGH-QUALITY SIO2-FILMS BY PYROLYSIS OF TETRAETHYLORTHOSILICATE [J].
BECKER, FS ;
PAWLIK, D ;
ANZINGER, H ;
SPITZER, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06) :1555-1563
[2]   PRECISION MOLECULAR-FLOW MEASUREMENT AND CONTROL FOR SINGLE AND MULTIGAS SYSTEMS [J].
KIESLING, RA ;
SULLIVAN, JJ ;
SANTELER, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :771-774
[3]   EXIT LOSS IN VISCOUS TUBE FLOW [J].
SANTELER, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1986, 4 (03) :348-352
[4]   LPCVD OF SILICON-OXIDE FILMS IN THE TEMPERATURE-RANGE 410-DEGREES-C TO 600-DEGREES-C FROM DIACETOXYDITERTIARYBUTOXYSILANE [J].
SMOLINSKY, G ;
DEAN, RE .
MATERIALS LETTERS, 1986, 4 (5-7) :256-260
[5]  
SULLIVAN JJ, 1986, SOLID STATE TECHNOL, V29, P113
[6]   LPCVD OF BOROPHOSPHOSILICATE GLASS FROM ORGANIC REACTANTS [J].
WILLIAMS, DS ;
DEIN, EA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) :657-664
[7]  
1987, MKS THERMAL MASS FLO
1