MODELING THE ANOMALOUS THRESHOLD VOLTAGE BEHAVIOR OF SUBMICROMETER MOSFETS

被引:19
作者
ARORA, ND
SHARMA, MS
机构
[1] Digital Equipment Corporation, Hudson, MA.
关键词
D O I
10.1109/55.144969
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports a simple yet accurate semi-empirical analytical model for simulating the anomalous threshold voltage behavior in submicrometer MOSFET's. The increase in the threshold voltage with decreasing channel length has been modeled by assuming a bias-independent, but channel-length-dependent, fixed charge at the source and drain ends. The new model requires two extra parameters in addition to the usual short-channel threshold voltage model parameters. These two parameters represent the magnitude of the fixed charge and the length over which the charge is spread at the source and drain ends. The model shows excellent agreement with the experimental threshold voltage data (within 2%) for submicrometer devices with varying oxide thickness, junction depth, and channel doping concentration.
引用
收藏
页码:92 / 94
页数:3
相关论文
共 10 条
[1]   SEMIEMPIRICAL MODEL FOR THE THRESHOLD VOLTAGE OF A DOUBLE IMPLANTED MOSFET AND ITS TEMPERATURE-DEPENDENCE [J].
ARORA, ND .
SOLID-STATE ELECTRONICS, 1987, 30 (05) :559-569
[2]  
ARORA ND, 1989, ADV MOS DEVICE PHYSI, V18, P236
[3]   A DYNAMIC AVERAGE MODEL FOR THE BODY EFFECT IN ION-IMPLANTED SHORT CHANNEL (L=1MU-META) MOSFETS [J].
CHATTERJEE, PK ;
LEISS, JE ;
TAYLOR, GW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (05) :606-607
[4]   FLAT-BAND VOLTAGE DEPENDENCE ON CHANNEL LENGTH IN SHORT-CHANNEL THRESHOLD-MODEL [J].
HUANG, JST ;
SCHRANKLER, JW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (05) :1001-1002
[5]  
HUANG JST, 1989, IEEE T ELECTRON DEV, V36, P1226
[6]   REVERSE SHORT-CHANNEL EFFECTS ON THRESHOLD VOLTAGE IN SUBMICROMETER SALICIDE DEVICES [J].
LU, CY ;
SUNG, JM .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (10) :446-448
[7]   AN ANOMALOUS INCREASE OF THRESHOLD VOLTAGES WITH SHORTENING THE CHANNEL LENGTHS FOR DEEPLY BORON-IMPLANTED N-CHANNEL MOSFETS [J].
NISHIDA, M ;
ONODERA, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (09) :1101-1103
[8]  
ORLOWSKI M, 1987, IEDM TECH DIG, P632
[9]   A NEW APPROACH TO THE MODELING OF NONUNIFORMLY DOPED SHORT-CHANNEL MOSFETS [J].
RATNAM, P ;
SALAMA, CAT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (09) :1289-1298
[10]  
SHARMA M, 1991, 7 P NASECODE C, P45