INVESTIGATION OF DEFECTS IN AMORPHOUS-SILICON FILMS USING POSITRON-ANNIHILATION

被引:1
作者
CHEN, YF [1 ]
WANG, CC [1 ]
TSENG, PK [1 ]
LUE, JT [1 ]
机构
[1] NATL TSING HUA UNIV,DEPT PHYS,HSINCHU 300,TAIWAN
关键词
D O I
10.1016/0375-9601(89)90692-0
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:493 / 496
页数:4
相关论文
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