CHARACTERIZATION OF MOCVD PBTIO3 THIN-FILMS

被引：36

作者：

SWARTZ, SL ^{[1
]}

SEIFERT, DA ^{[1
]}

NOEL, GT ^{[1
]}

SHROUT, TR ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802

来源：

FERROELECTRICS | 1989年 / 93卷

关键词：

D O I：

10.1080/00150198908017318

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：37 / 43

页数：7

共 11 条

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[7]

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[8] RF PLANAR MAGNETRON SPUTTERING AND CHARACTERIZATION OF FERROELECTRIC PB(ZR,TI)O3 FILMS [J].

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