RADICAL AND MOLECULAR PRODUCT CONCENTRATION MEASUREMENTS IN CF4 AND CH4 RADIO-FREQUENCY PLASMAS BY INFRARED TUNABLE DIODE-LASER ABSORPTION

被引：61
|
作者：
WORMHOUDT, J
机构：
[1] Center for Chemical and Environmental Physics, Aerodyne Research Inc., Billerica, Massachusetts
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词：
D O I：
10.1116/1.576837
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Infrared tunable diode laser absorption studies of radicals and stable molecules formed in radio frequency (rf) plasmas are being carried out in a laboratory reactor which allows a long absorption path. In this paper we report studies of CF4 and CH4 rf plasmas. We report absolute concentration measurements as functions of total pressure and rf power for CF2 and C2Fbin CF4 plasmas and for CH3 and C2H2 in CH4 plasmas. © 1990, American Vacuum Society. All rights reserved.
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页码：1722 / 1725
页数：4
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