SHORT-WAVELENGTH ANNULAR-FIELD OPTICAL-SYSTEM FOR IMAGING 10TH-MICRON FEATURES

被引:15
作者
WOOD, OR [1 ]
SILFVAST, WT [1 ]
JEWELL, TE [1 ]
机构
[1] AT&T BELL LABS,MURRAY HILL,NJ 07974
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期
关键词
D O I
10.1116/1.584500
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1613 / 1615
页数:3
相关论文
共 7 条
[1]   SILICON-CARBIDE DIFFRACTION GRATING FOR VACUUM UV - FEASIBILITY [J].
CHOYKE, WJ ;
PARTLOW, WD ;
SUPERTZI, EP ;
VENSKYTIS, FJ ;
BRANDT, GB .
APPLIED OPTICS, 1977, 16 (08) :2013-2014
[2]  
FEDER R, 1984, XRAY MICROSCOPY, P279
[3]  
Hunter W. R., 1973, Electro-Optical Systems Design, V5, P16
[4]   NEW CONCEPTS IN PROJECTION MASK ALIGNERS [J].
OFFNER, A .
OPTICAL ENGINEERING, 1975, 14 (02) :130-132
[5]  
SAMSON JA, 1967, TECHNOLOGIES VACUUM, P38
[6]   Tenth micron lithography with a 10 Hz 37-2 nm sodium [J].
Silvast, W.T. ;
Wood II, O.R. .
Microelectronic Engineering, 1988, 8 (1-2) :3-11
[7]   MEASUREMENT OF SOFT-X-RAY MULTILAYER MIRROR REFLECTANCE AT NORMAL INCIDENCE USING LASER-PRODUCED PLASMAS [J].
TRAIL, JA ;
BYER, RL ;
BARBEE, TW .
APPLIED PHYSICS LETTERS, 1988, 52 (04) :269-271