CRYSTALLIZATION AND PROPERTIES OF A LOW-K GLASS COMPOSITE

被引:7
作者
JEAN, JH
CHANG, RL
CHANG, CR
机构
[1] Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 2A期
关键词
CRYSTALLIZATION; GLASS COMPOSITE; DIELECTRIC; THERMAL EXPANSION;
D O I
10.1143/JJAP.34.572
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of gallium oxide on crystallization, thermal expansion and dielectric behaviors of a binary glass composite which contains a low-softening Pyrex borosilicate glass and a high-softening high silica glass has been studied. It is found that on sintering, cristobalite precipitates out of the initial amorphous binary glass mixture; however, the addition of gallium oxide prevents this. The above result is further supported by microstructural observation, thermal expansion and dielectric constant measurements.
引用
收藏
页码:572 / 577
页数:6
相关论文
共 50 条
  • [21] Influence of HF catalyst on the microstructure properties of ultra low-k thin films prepared by sol-gel method
    何志巍
    徐大印
    江祥华
    王印月
    Chinese Physics B, 2008, (08) : 3021 - 3025
  • [22] Sequential lateral solidification of silicon thin films on low-k dielectrics for low temperature integration
    Carta, Fabio
    Gates, Stephen M.
    Limanov, Alexander B.
    Hlaing, Htay
    Im, James S.
    Edelstein, Daniel C.
    Kymissis, Ioannis
    APPLIED PHYSICS LETTERS, 2014, 105 (24)
  • [23] Low-k dielectric materials derived from ZSM-5 zeolite
    Shi, Jun Zuo
    Sun, Tu Lai
    Zhou, Fu Wei
    Zhu, Xiao Li
    Li, Lei
    Chen, Xiang Ming
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2024, 107 (04) : 2317 - 2324
  • [24] Low-temperature crystallization of metallic glass induced by electropulsing
    Hao, T
    Tanimoto, H
    Mizubayashi, H
    METASTABLE, MECHANICALLY ALLOYED AND NANOCRYSTALLINE MATERIALS, 2005, 24-25 : 205 - 208
  • [25] Electro-optical reliability characterization of advanced Cu/low-k interconnects
    Guedj, C
    Guillaumond, JF
    Mondon, F
    Arnaud, L
    Arnal, J
    Reinhold, J
    Torres, J
    2005 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 43RD ANNUAL, 2005, : 584 - 585
  • [26] Test structure design for precise understanding of Cu/low-k dielectric reliability
    Tan, T. L.
    Gan, C. L.
    Du, A. -Y.
    Cheng, C. K.
    Ng, C. M.
    Chan, L.
    2007 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 45TH ANNUAL, 2007, : 632 - +
  • [27] Polarity Dependence of the Conduction Mechanism in Inter-Level Low-k Dielectrics
    Lin, Mingte
    Liang, James W.
    Wang, C. J.
    Juan, Alex
    Su, K. C.
    2012 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM (IRPS), 2012,
  • [28] Binary crystallizable glass composite for low-dielectric multilayer ceramic substrate
    Jean, JH
    Shen, JI
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1996, 35 (07): : 3942 - 3946
  • [29] Crystallization, microstructures and properties of low temperature co-fired CaO-Al2O3-SiO2 glass-ceramic
    Bo Li
    Zhenjun Qing
    Yingxiang Li
    Hao Li
    Shuren Zhang
    Journal of Electroceramics, 2016, 37 : 145 - 150
  • [30] Crystallization, microstructures and properties of low temperature co-fired CaO-Al2O3-SiO2 glass-ceramic
    Li, Bo
    Qing, Zhenjun
    Li, Yingxiang
    Li, Hao
    Zhang, Shuren
    JOURNAL OF ELECTROCERAMICS, 2016, 37 (1-4) : 145 - 150