PLASMA CHARACTERIZATION IN SPUTTERING PROCESSES USING THE LANGMUIR PROBE TECHNIQUE

被引：22
作者：
ESER, E
OGILVIE, RE
TAYLOR, KA
机构：
[1] MIT, CAMBRIDGE, MA 02139 USA
[2] HIGH VACUUM CORP, HINGHAM, MA 02043 USA
来源：
THIN SOLID FILMS | 1980年 / 68卷 / 02期
关键词：
D O I：
10.1016/0040-6090(80)90270-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：381 / 392
页数：12
相关论文
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