SURFACE-CHEMISTRY AND STRUCTURE OF ULTRAFINE SILICON-CARBIDE - AN FT-IR STUDY

被引：51
作者：
RAMIS, G
QUINTARD, P
CAUCHETIER, M
BUSCA, G
LORENZELLI, V
机构：
[1] UNIV GENOA,FAC INGN,IST CHIM,I-16129 GENOA,ITALY
[2] UNIV LIMOGES,FAC SCI,F-87060 LIMOGES,FRANCE
[3] CENS,DEPT PHYSICOCHIM,F-91191 GIF SUR YVETTE,FRANCE
来源：
JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1989年 / 72卷 / 09期
关键词：
D O I：
10.1111/j.1151-2916.1989.tb06304.x
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1692 / 1697
页数：6
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