REFRACTORY SILICIDES OF TITANIUM AND TANTALUM FOR LOW-RESISTIVITY GATES AND INTERCONNECTS

被引：36

作者：

MURARKA, SP

FRASER, DB

SINHA, AK

LEVINSTEIN, HJ

机构：

来源：

IEEE JOURNAL OF SOLID-STATE CIRCUITS | 1980年 / 15卷 / 04期

关键词：

D O I：

10.1109/JSSC.1980.1051425

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：474 / 482

页数：9

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