REFRACTORY SILICIDES OF TITANIUM AND TANTALUM FOR LOW-RESISTIVITY GATES AND INTERCONNECTS

被引：36
作者：
MURARKA, SP
FRASER, DB
SINHA, AK
LEVINSTEIN, HJ
机构：
来源：
IEEE JOURNAL OF SOLID-STATE CIRCUITS | 1980年 / 15卷 / 04期
关键词：
D O I：
10.1109/JSSC.1980.1051425
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：474 / 482
页数：9
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