STOICHIOMETRY OF THE C+SIO2 REACTION

被引:117
作者
BIERNACKI, JJ [1 ]
WOTZAK, GP [1 ]
机构
[1] CLEVELAND STATE UNIV,FENN COLL ENGN,CLEVELAND,OH 44115
关键词
D O I
10.1111/j.1151-2916.1989.tb05964.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:122 / 129
页数:8
相关论文
共 26 条
[1]  
BIERNACKI JJ, 1987, THESIS CLEVELAND STA
[2]  
Bonhoeffer KF, 1928, Z PHYS CHEM-STOCH VE, V131, P363
[3]   THE STABILITY OF GASEOUS DIATOMIC OXIDES [J].
BREWER, L ;
MASTICK, DF .
JOURNAL OF CHEMICAL PHYSICS, 1951, 19 (07) :834-843
[4]  
GELD PV, 1948, DOKL AKAD NAUK SSSR, V61
[5]  
GRUBE G, 1949, Z ELEKTROCHEM, V53, P339
[6]  
Gunther KG., 1958, GLASTECH BER, V31, P9
[7]   A STUDY OF THE KINETICS OF HIGH-TEMPERATURE CARBON-SILICA REACTIONS IN AN ABLATIVE POLYMER COMPOSITE [J].
HENDERSON, JB ;
TANT, MR .
POLYMER COMPOSITES, 1983, 4 (04) :233-237
[9]   REACTIONS BETWEEN SILICA AND GRAPHITE [J].
KLINGER, N ;
STRAUSS, EL ;
KOMAREK, KL .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1966, 49 (07) :369-&
[10]  
Kubaschewski O, 1979, METALLURGICAL THERMO, P221