THE LOCALIZATION AND CRYSTALLOGRAPHIC DEPENDENCE OF SI SUBOXIDE SPECIES AT THE SIO2/SI INTERFACE

被引:286
作者
GRUNTHANER, PJ [1 ]
HECHT, MH [1 ]
GRUNTHANER, FJ [1 ]
JOHNSON, NM [1 ]
机构
[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304
关键词
D O I
10.1063/1.338215
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:629 / 638
页数:10
相关论文
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