CRACK-GROWTH RESISTANCE OF IN-SITU-TOUGHENED SILICON-NITRIDE

被引:41
作者
CHOI, SR [1 ]
SALEM, JA [1 ]
机构
[1] CLEVELAND STATE UNIV,CLEVELAND,OH 44115
关键词
D O I
10.1111/j.1151-2916.1994.tb07265.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The fracture toughness of a commercial, hot-pressed, in situ-toughened silicon nitride with an elongated grain structure is determined by four different testing methods. The fracture toughness is found to be 5.76 +/- 0.27, 8.48 +/- 0.50, 10.16 +/- 0.66, and 10.68 +/- 0.39 MPa.m1/2, respectively, by indentation crack size measurement, indentation strength, single-edge-precracked-beam, and chevron-notched-beam methods. The discrepancy in fracture toughness between the testing methods is related to R-curve behavior, as measured using the indentation strength technique. These results indicate that there is no unique fracture toughness value and that a fracture toughness testing method with appropriate qualifiers is needed for rising R-curve materials. Therefore, care should be taken in interpreting and utilizing fracture toughness values evaluated from different testing methods if a material exhibits a rising R-curve. Complete characterization of the R-curve may be a prerequisite.
引用
收藏
页码:1042 / 1046
页数:5
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