DEPOSITION OF OPTICAL COATINGS BY LASER-ASSISTED EVAPORATION AND BY PHOTO-ASSISTED CHEMICAL VAPOR-DEPOSITION

被引：15

作者：

SANKUR, H

机构：

[1] Rockwell Science Center, Thousand Oaks, CA 91360

来源：

THIN SOLID FILMS | 1992年 / 218卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(92)90915-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper two optical coating techniques that utilize photons, laser-assisted evaporation and photo-assisted chemical vapor deposition (photo-CVD), are reviewed. Laser-assisted evaporation can produce high quality thin films and can be used advantageously to reproduce the stoichiometry of source materials of multielement compounds. Photo-CVD is a deposition technique that can be used to coat large area substrates and selectively small areas of a substrate. Both techniques are amenable for low substrate temperature deposition.

引用

页码：161 / 169

页数：9

共 92 条

[1]

AKSAKHALYAN AD, 1982, SOV PHYS-TECH PHYS, V27, P969

[2] SPECTROSCOPIC ANALYSIS OF ELECTRONICALLY EXCITED SPECIES IN XECL EXCIMER LASER-INDUCED PLASMAS FROM THE ABLATED HIGH-TEMPERATURE SUPERCONDUCTOR YBA2CU3O7 [J].