A METHOD OF QUANTITATIVE CONTAMINATION WITH METALLIC IMPURITIES OF THE SURFACE OF A SILICON-WAFER

被引：126

作者：

HOURAI, M ^{[1
]}

NARIDOMI, T ^{[1
]}

OKA, Y ^{[1
]}

MURAKAMI, K ^{[1
]}

SUMITA, S ^{[1
]}

FUJINO, N ^{[1
]}

SHIRAIWA, T ^{[1
]}

机构：

[1] OSAKA TITANIUM CO LTD, AMAGASAKI, HYOGO 660, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 12期

关键词：

D O I：

10.1143/JJAP.27.L2361

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L2361 / L2363

页数：3

共 11 条

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