PHOTO-VOLTAGE AND STABILITY OF AN N-TYPE SILICON SEMICONDUCTOR COATED WITH METAL OR METAL-FREE PHTHALOCYANINE THIN-FILMS IN AQUEOUS REDOX SOLUTIONS

被引：38
作者：
NAKATO, Y
SHIOJI, M
TSUBOMURA, H
机构：
来源：
JOURNAL OF PHYSICAL CHEMISTRY | 1981年 / 85卷 / 12期
关键词：
D O I：
10.1021/j150612a014
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
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页码：1670 / 1672
页数：3
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