FIB DIRECT WRITE LITHOGRAPHY

被引：0
|
作者：
GAMO, K [1 ]
NAMBA, S [1 ]
机构：
[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C375 / C375
页数：1
相关论文
共 50 条
  • [31] Simulation flow and model verification for laser direct-write lithography
    Onanuga, Temitope
    Rumler, Maximilian
    Erdmann, Andreas
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2017, 16 (03):
  • [32] On the spatial resolution limit of direct-write electron beam lithography
    Jiang, Nan
    MICROELECTRONIC ENGINEERING, 2017, 168 : 41 - 44
  • [33] Direct-write electron beam lithography: History and state of the art
    Carr, DW
    Tiberio, RC
    MATERIALS ISSUES AND MODELING FOR DEVICE NANOFABRICATION, 2000, 584 : 33 - 43
  • [34] Economic production of submicron ASICs with laser beam direct write lithography
    Schomburg, C
    Hofflinger, B
    Springer, R
    WijnaendtsvanResandt, R
    MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 509 - 512
  • [35] FIB metrology in advanced lithography
    Barnes, D
    Musil, CR
    Yansen, D
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 537 - 545
  • [36] High-current electron optical design for reflective electron beam lithography direct write lithography
    McCord, Mark
    Kojima, Shinichi
    Petric, Paul
    Brodie, Alan
    Sun, Jeff
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (06): : C6C1 - C6C5
  • [37] Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept
    Petric, Paul
    Bevis, Chris
    McCord, Mark
    Carroll, Allen
    Brodie, Alan
    Ummethala, Upendra
    Grella, Luca
    Cheung, Anthony
    Freed, Regina
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2010, 28 (06): : C6C6 - C6C13
  • [38] TRYING TO WRITE A FIB POEM #2
    Cohen, Marion Deutsche
    JOURNAL OF HUMANISTIC MATHEMATICS, 2022, 12 (01): : 474 - 474
  • [39] DIRECT WRITE GRAYSCALE LITHOGRAPHY FOR ARBITRARY SHAPED MICRO-OPTICAL SURFACES
    Eckstein, H. -C.
    Stumpf, M.
    Schleicher, P.
    Kleinle, S.
    Matthes, A.
    Zeitner, U. D.
    Braeuer, A.
    2015 20TH MICROOPTICS CONFERENCE (MOC), 2015,
  • [40] Sub-pixel alignment for direct-write electron beam lithography
    Anderson, EH
    Ha, D
    Liddle, JA
    MICROELECTRONIC ENGINEERING, 2004, 73-4 : 74 - 79
12345