X-RAY PHOTOEMISSION STUDIES OF SILICON AND GERMANIUM

被引:7
作者
VESELY, CJ [1 ]
KINGSTON, DL [1 ]
LANGER, DW [1 ]
机构
[1] AEROSP RES LABS,WRIGHT PATTERSON AFB,OH
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1973年 / 59卷 / 01期
关键词
D O I
10.1002/pssb.2220590111
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:121 / 132
页数:12
相关论文
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