DIFFUSIVE, ELECTROSTATIC AND GRAVITATIONAL DEPOSITION OF SUSPENSIONS IN THE ENTRANCE OF A PARALLEL CHANNEL

A numerical investigation of the mechanics of deposition in a parallel channel from the channel inlet to a distance of 7 channel depths has been made under the combined influences of diffusion, electricity and gravitation. A mathematical model has been developed for the deposition process restricted to laminar flow of dilute suspensions in electrical and gravitational fields with surface adhesions. The results show that the gravity flow parameter affects the rate of deposition on the walls of the channel algon with the electrostatic charge parameters which also alters the deposition process quite appreciably. © 1979.