UNIQUE CHARACTERISTICS OF THIN-FILM ELECTROCHEMICAL ETCHING

被引:0
作者
TOMMASINO, L
TORRI, G
NOTARO, M
机构
来源
NUCLEAR TRACKS AND RADIATION MEASUREMENTS | 1991年 / 19卷 / 1-4期
关键词
THIN FILM; ELECTROCHEMICAL ETCHING; SPARK COUNTER; TRACK ETCH; NEUTRONS;
D O I
暂无
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
The spark counter makes it possible to scan large detector areas and to measure neutron fluences and radon exposures with unique sensitivity. For neutron-induced recoils and for short-etchable tracks (such as alpha-particle tracks in polycarbonate) the spark counter is no more useful. In this case the electrochemical etching process is very often used to facilitate the track counting, in spite of its limitations of high-voltage requirements. In this paper, it will be illustrated how simple is to overcome these shortcomings by thin-film electrochemical etching.
引用
收藏
页码:223 / 225
页数:3
相关论文
共 9 条