ENHANCED ARE APPARATUS AND TIN SYNTHESIS

被引：35

作者：

YOSHIHARA, H

MORI, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 04期

关键词：

D O I：

10.1116/1.570130

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

To apply the activated reactive evaporation (ARE) process to coatings for telecommunication components, the deposition rate must be less than 0. 1 mu m/min. The weak points in the ARE process have been improved by attachment of an electron emitting electrode. The new process was tested by synthesizing titanium nitride. Film properties were examined by measuring Vickers hardness and residual stress, observation of surface and cross-section morphology, and x-ray diffraction analysis.

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页码：1007 / 1012

页数：6

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