PULSED CO2-LASER ETCHING OF POLYIMIDE

被引：79

作者：

BRANNON, JH

LANKARD, JR

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 18期

关键词：

D O I：

10.1063/1.96989

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1226 / 1228

页数：3

共 8 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] EXCIMER LASER ETCHING OF POLYIMIDE [J].

BRANNON, JH ;

LANKARD, JR ;

BAISE, AI ;

BURNS, F ;

KAUFMAN, J .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) :2036-2043

[3] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[4] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J].

GORODETSKY, G ;

KAZYAKA, TG ;

MELCHER, RL ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1985, 46 (09) :828-830

[5] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS [J].

KOREN, G ;

YEH, JTC .

JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) :2120-2126

[6] CO2-LASER ASSISTED UV ABLATIVE PHOTOETCHING OF KAPTON FILMS [J].

KOREN, G .

APPLIED PHYSICS LETTERS, 1984, 45 (01) :10-12

[7] ABLATIVE PHOTODECOMPOSITION OF POLYMER-FILMS BY PULSED FAR-ULTRAVIOLET (193 NM) LASER-RADIATION - DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS [J].

SRINIVASAN, R ;

BRAREN, B .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (10) :2601-2609

[8] KINETICS OF THE ABLATIVE PHOTO-DECOMPOSITION OF ORGANIC POLYMERS IN THE FAR ULTRAVIOLET (193 NM) [J].

SRINIVASAN, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :923-926

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