ABLATION OF POLY(2-HYDROXYETHYL METHACRYLATE) BY 193-NM EXCIMER LASER-RADIATION

被引：7
作者：
CHIRILA, TV
VANSAARLOOS, PP
机构：
[1] Lions Eye Institute, Nedlands, Western Australia, 6009, 2 Verdun Street, A Block
来源：
JOURNAL OF APPLIED POLYMER SCIENCE | 1992年 / 44卷 / 08期
关键词：
D O I：
10.1002/app.1992.070440806
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Data on the ablation of poly (2-hydroxyethyl methacrylate) (PHEMA) by 193-nm radiation . pulses, produced by an ArF excimer laser, are presented for the first time and are compared with the data for poly(methyl methacrylate) (PMMA). The ablation rate of PHEMA is lower than that of PMMA and some possible explanations are advanced. The other features of the etch curves are similar and confirm a predicted ablative behavior of the addition polymers susceptible to depolymerization Geometric aspects of the ablated polymer's surface, and the influence of inhomogeneities in the material, are also presented and discussed.
引用
收藏
页码：1355 / 1363
页数：9
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