A LASER INTERFEROMETER FOR MONITORING THIN-FILM PROCESSES - APPLICATION TO POLYMER DISSOLUTION

[1] ALFREY T., 1996, J POLYM SCI C, V12, P249, DOI DOI 10.1002/P0LC.5070120119

[2] ANDERS H, 1965, THIN FILMS OPTICS

[3] Born M, 1980, PRINCIPLES OPTICS

[4] BOSENBERG WA, 1983, SOLID STATE TECH JUL, P79

[5] MEASUREMENT OF FILM THICKNESS USING INFRARED INTERFERENCE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1967, 38 (08) : 1107 - &

[6] GILLESPIE DJ, 1967, MEAS TECH, P102

[7] Heavens O.S, 1991, OPTICAL PROPERTIES T

[8] JACOBSEN R, 1965, PROG OPTICS, V5, P247

[9] IN-PROCESS THICKNESS MONITOR FOR POLYCRYSTALLINE SILICON DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (01) : 112 - &

[10] KLEINKNECHT HP, 1978, J ELECTROCHEM SOC SO, P798

[1] ALFREY T., 1996, J POLYM SCI C, V12, P249, DOI DOI 10.1002/P0LC.5070120119

[2] ANDERS H, 1965, THIN FILMS OPTICS

[3] Born M, 1980, PRINCIPLES OPTICS

[4] BOSENBERG WA, 1983, SOLID STATE TECH JUL, P79

[5] MEASUREMENT OF FILM THICKNESS USING INFRARED INTERFERENCE [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1967, 38 (08) : 1107 - &

[6] GILLESPIE DJ, 1967, MEAS TECH, P102

[7] Heavens O.S, 1991, OPTICAL PROPERTIES T

[8] JACOBSEN R, 1965, PROG OPTICS, V5, P247

[9] IN-PROCESS THICKNESS MONITOR FOR POLYCRYSTALLINE SILICON DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (01) : 112 - &

[10] KLEINKNECHT HP, 1978, J ELECTROCHEM SOC SO, P798