EFFECT OF ANNEALING ON SEMICONDUCTOR IN A THIN-FILM TRANSISTOR

被引:10
|
作者
NORIAN, KH [1 ]
机构
[1] IMPERIAL COLL,DEPT ELECT ENGN,MAT SECT,LONDON SW7 2BT,ENGLAND
关键词
D O I
10.1016/0040-6090(77)90360-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:195 / 201
页数:7
相关论文
共 50 条
  • [1] EFFECT OF SEMICONDUCTOR FILM THICKNESS ON THIN-FILM TRANSISTOR PERFORMANCE
    TICKLE, AC
    SWYSTUN, EJ
    TRELEAVE.DH
    RADIO AND ELECTRONIC ENGINEER, 1966, 31 (05): : 262 - &
  • [2] Effect of annealing of NbLaO dielectric on the electrical properties of ZnO thin-film transistor
    Liu, Yurong
    Xiang, Yinxue
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2019, 37 (06):
  • [3] Hall Effect in Thin-Film Transistor
    Kimura, Mutsumi
    Matsumoto, Takaaki
    Yoshikawa, Akito
    Matsuda, Tokiyoshi
    Ozawa, Tokuro
    Aoki, Koji
    Kuo, Chih-Che
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (08) : 3335 - 3337
  • [4] Degraded OFF-State Current of Organic Thin-Film Transistor and Annealing Effect
    Hong, Sunghun
    Choi, Jongsun
    Kim, Youngmin
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2008, 55 (12) : 3602 - 3604
  • [5] EFFECT OF ANNEALING ON THE ELECTRON-MOBILITY AND CONCENTRATION IN CDSE THIN-FILM TRANSISTOR AND "METAL-INSULATOR-SEMICONDUCTOR-METAL STRUCTURES
    MORIN, F
    RICHARD, J
    THIN SOLID FILMS, 1979, 57 (01) : 57 - 57
  • [6] INFLUENCE OF FINITE SEMICONDUCTOR THICKNESS ON THIN-FILM TRANSISTOR CHARACTERISTICS
    PAUWELS, HJ
    BURGELMAN, M
    THIN SOLID FILMS, 1975, 27 (02) : 273 - 286
  • [7] Influence of Oxide Semiconductor Thickness on Thin-Film Transistor Characteristics
    Nakata, Mitsuru
    Tsuji, Hiroshi
    Sato, Hiroto
    Nakajima, Yoshiki
    Fujisaki, Yoshihide
    Takei, Tatsuya
    Yamamoto, Toshihiro
    Fujikake, Hideo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (03)
  • [8] THIN-FILM TRANSISTOR
    DEGRAAFF, HC
    KOELMANS, H
    PHILIPS TECHNICAL REVIEW, 1966, 27 (07): : 200 - +
  • [9] Reduction of Hump Effect of Thin-Film Transistor by SiNx Film
    Kobayashi, T.
    Matsuo, N.
    Heya, A.
    Yokoyama, S.
    PROCEEDINGS OF 2013 TWENTIETH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD 13): TFT TECHNOLOGIES AND FPD MATERIALS, 2013, : 117 - 120
  • [10] Effect of Two-Step Annealing on High Stability of a-IGZO Thin-Film Transistor
    Peng, Cong
    Yang, Shibo
    Pan, Chengchao
    Li, Xifeng
    Zhang, Jianhua
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (10) : 4262 - 4268