DEPOSITION AND STUDY OF CVD-TANTALUM CARBIDE THIN-FILMS

被引：7
|
作者：
GESHEVA, K [1 ]
VLAKHOV, E [1 ]
机构：
[1] BULGARIAN ACAD SCI,NADJAKOV INST SOLID STATE PHYS,BU-1113 SOFIA,BULGARIA
来源：
MATERIALS LETTERS | 1987年 / 5卷 / 7-8期
关键词：
D O I：
10.1016/0167-577X(87)90110-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
6
引用
收藏
页码：276 / 279
页数：4
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