EFFICIENCY MEASUREMENTS FOR A LOW CHARGE-STATE IONIC INJECTION INTO AN ELECTRON-BEAM ION-SOURCE

被引：27

作者：

VISENTIN, B ^{[1
]}

VANDUPPEN, P ^{[1
]}

LEROY, PA ^{[1
]}

HARRAULT, F ^{[1
]}

GOBIN, R ^{[1
]}

机构：

[1] CERN,ISOLDE,CH-1211 GENEVA 23,SWITZERLAND

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 101卷 / 03期

关键词：

D O I：

10.1016/0168-583X(95)00498-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We report injection efficiency measurements when an external primary low charge ion beam is injected into Dione EBIS. These measurements have been performed using nitrogen and argon ion beams. The total efficiencies reach 59 and 52% respectively. The partial efficiencies, related to the main ionic charge state, reaches 30% for N7+ and 9.4% for Ar14+. These results correspond to an injection before the confinement period (fast injection mode). The other method (injection during the confinement time) has been also performed using nitrogen ions. The results are less spectacular: only a 0.4 parts per thousand total efficiency has been measured.

引用

页码：275 / 279

页数：5

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