YBA2CU3O7-X FILMS ON YTTRIA-STABILIZED ZRO2 SUBSTRATES - INFLUENCE OF THE SUBSTRATE MORPHOLOGY

被引:28
作者
BRORSSON, G
OLSSON, E
IVANOV, ZG
STEPANTSOV, EA
ALARCO, JA
BOIKOV, Y
CLAESON, T
BERASTEGUI, P
LANGER, V
LOFGREN, M
机构
[1] CHALMERS UNIV TECHNOL,DEPT INORGAN CHEM,S-41296 GOTHENBURG,SWEDEN
[2] CHALMERS UNIV TECHNOL,DEPT APPL ELECTR,S-41296 GOTHENBURG,SWEDEN
[3] MOSCOW CRYSTALLOG INST,MOSCOW 117333,RUSSIA
[4] AF IOFFE PHSICO TECH INST,ST PETERSBURG 194021,RUSSIA
关键词
D O I
10.1063/1.356557
中图分类号
O59 [应用物理学];
学科分类号
摘要
c-axis-oriented YBa2Cu3O7-x (YBCO) thin films were laser deposited on (001) yttria-stabilized ZrO2 (YSZ) substrates with different surface morphologies. The in-plane orientation of the films on smooth substrates was sensitive to the deposition conditions, often resulting in mixed orientations. However, a strongly dominating [110]YBCO//[110]YSZ orientation was obtained at a deposition temperature of 770-degrees-C. Films on substrates with surface steps, induced by depositing a homoepitaxial buffer layer or by thermally annealing the substrate, had a [110]YBCO//[100]YSZ orientation when deposited at the same temperature. It was concluded that the [110]YBCO//[100]YSZ orientation was promoted by a graphoepitaxial mechanism. Films prepared under identical conditions on smooth and stepped substrates grew with extended c axes on the former. It is proposed that the extension can be induced by disorder, invoked by a low oxygen pressure and a low density of adsorption sites. The disorder may be eliminated by either an increase of the oxygen pressure or an increase of the density of adsorption sites in the form of steps. The film microstructure influenced the microwave surface resistance, which was similar for films with one exclusive in-plane orientation and higher for films with mixed orientations. The films on the stepped surfaces had superior superconducting properties; inductive measurements gave a T(c)onset of 88 K, a DELTAT(c)((90% - 10%)) of 0.2 K, and the transport j(c) was 1.5 x 10(6) A/CM2 at 83 K, for films on substrates with homoepitaxial buffer layers.
引用
收藏
页码:7958 / 7966
页数:9
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