BINDING AND DIFFUSION OF A SI ADATOM ON THE SI(100) SURFACE

被引:276
|
作者
BROCKS, G [1 ]
KELLY, PJ [1 ]
CAR, R [1 ]
机构
[1] SCUOLA INT SUPER STUDI AVANZATI,TRIESTE,ITALY
关键词
D O I
10.1103/PhysRevLett.66.1729
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The binding sites for adsorption of a single Si atom on the reconstructed Si(100) surface are identified using first-principles total-energy calculations. We establish several saddle points for the migration of the adatom by mapping out the total energy as a function of its position on the surface. For diffusion parallel to the dimer rows on the surface, we find an activation energy of 0.6 eV; for diffusion perpendicular to the rows, the activation energy is 1.0 eV. One-dimensional hopping motion of individual adatoms should be observable by scanning tunneling microscopy at moderately low temperatures.
引用
收藏
页码:1729 / 1732
页数:4
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