LOW-ENERGY X-RAY RESPONSE OF GE DETECTORS WITH AMORPHOUS-GE ENTRANCE CONTACTS

被引:52
作者
LUKE, PN
ROSSINGTON, CS
WESELA, MF
机构
[1] Engineering Division, Lawrence Berkeley Laboratory University of California, Berkeley, CA
关键词
D O I
10.1109/23.322861
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The low energy x-ray response of Ge detectors with amorphous Ge entrance contacts has been evaluated. The spectral background due to near contact incomplete charge collection was found to consist of two components: a low level component which is insensitive to applied voltage and a high level step-like component which is voltage dependent. At high operating voltages, the high level component can be completely suppressed, resulting in background levels which are much lower than those previously observed using Ge detectors with Pd surface barrier or B ion implanted contacts, and which also compare favorably to those obtained with Si(Li) x-ray detectors. The response of these detectors to Fe-55 and 1.77 keV x-rays is shown. A qualitative explanation of the origins of the observed background components is presented.
引用
收藏
页码:1074 / 1079
页数:6
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